论文信息 - Effective reduction of interfacial traps in Al2O3/GaAs (001) gate stacks using surface engineering and thermal annealing - 字舞流文

Effective reduction of interfacial traps in Al2O3/GaAs (001) gate stacks using surface engineering and thermal annealing

C. Merckling | J. Kwo | M. Caymax | M. Heyns | M. Meuris | M. Hong | J. Penaud | C. Lu | J. Dekoster | Wei-e Wang | Y. Chang | Wei-E. Wang | C. Y. Lu | C. Y. Lu