Optical and structural characteristics of Al2O3 films deposited by the reactive ionized cluster beam method
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[1] M. Tabe,et al. Effect of Growth Temperature on Si MBE Film , 1981 .
[2] C. Weissmantel,et al. Structure of aluminium oxide films deposited by d.c. reactive sputtering , 1980 .
[3] R. Bunshah,et al. Alumina deposition by activated reactive evaporation , 1977 .
[4] H. Thompson,et al. Electron‐Beam Evaporated Al2 O 3 on Si , 1975 .
[5] D. M. Hoffman,et al. Al2O3 Films Prepared by Electron-Beam Evaporation of Hot-Pressed Al2O3 in Oxygen Ambient , 1971 .
[6] C. Salama. RF Sputtered Aluminum Oxide Films on Silicon , 1970 .
[7] Toshio Tanaka,et al. The Characteristics of Al-Al2O3-Si Structures Formed by Reactive Suttering , 1968 .
[8] A. Waxman,et al. Al2O3‐SILICON INSULATED GATE FIELD EFFECT TRANSISTORS , 1968 .
[9] J. A. Aboaf,et al. Deposition and Properties of Aluminum Oxide Obtained by Pyrolytic Decomposition of an Aluminum Alkoxide , 1967 .
[10] R. Frieser. Phase Changes in Thin Reactively Sputtered Alumina Films , 1966 .
[11] P. White,et al. Electrical Properties of Evaporated Aluminum Oxide Films , 1962 .