Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing
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A. Tünnermann | V. Beladiya | T. Faraz | W. M. M. Kessels | A. Szeghalmi | A. Tünnermann | V. Beladiya | W. Kessels | A. Szeghalmi | T. Faraz
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