Inspection 13.2-nm table-top full-field microscope

We present results on a table-top microscope that uses an EUV stepper geometry to capture full-field images with a halfpitch spatial resolution of 55 nm. This microscope uses a 13.2 nm wavelength table-top laser for illumination and acquires images of reflective masks with exposures of 20 seconds. These experiments open the path to the realization of high resolution table-top imaging systems for actinic defect characterization.

[1]  J A Liddle,et al.  Sub-38 nm resolution tabletop microscopy with 13 nm wavelength laser light. , 2006, Optics letters.

[2]  Randy A. Bartels,et al.  Analysis of extreme ultraviolet microscopy images of patterned nanostructures based on a correlation method , 2008 .

[3]  E. Anderson.  Specialized electron beam nanolithography for EUV and X-ray diffractive optics , 2006, IEEE Journal of Quantum Electronics.

[4]  J A Liddle,et al.  Nanoimaging with a compact extreme-ultraviolet laser. , 2005, Optics letters.

[5]  A. Barty,et al.  Actinic inspection of extreme ultraviolet programed multilayer defects and cross-comparison measurements , 2006 .

[6]  Donald W. Sweeney,et al.  Aerial Image Microscope for the inspection of defects in EUV masks , 2002, Photomask Technology.

[7]  Kenneth A. Goldberg,et al.  Actinic extreme ultraviolet mask inspection beyond 0.25numericalaperture , 2008 .

[8]  Hiroo Kinoshita,et al.  Resolution Enhancement of Extreme Ultraviolet Microscope Using an Extreme Ultraviolet Beam Splitter , 2008 .

[9]  Przemyslaw Wachulak,et al.  Single-shot extreme ultraviolet laser imaging of nanostructures with wavelength resolution. , 2008, Optics letters.

[10]  Kenneth A. Goldberg,et al.  EUV and non-EUV inspection of reticle defect repair sites , 2007, SPIE Advanced Lithography.

[11]  D Attwood,et al.  Reflection mode imaging with nanoscale resolution using a compact extreme ultraviolet laser. , 2005, Optics express.

[12]  Jorge J. Rocca,et al.  Demonstration of high-repetition-rate tabletop soft-x-ray lasers with saturated output at wavelengths down to 13.9 nm and gain down to 10.9 nm , 2005 .

[13]  E. Anderson,et al.  Resolution determination in X-ray microscopy: an analysis of the effects of partial coherence and illumination spectrum. , 1998, Journal of X-ray science and technology.