Chemical State and Deposition Rate of Nickel Ion Deposit Produced on Heated Surface in High Pressure Boiling Water

Nickel ion deposit was produced on a heated rod surface in high pressure boiling water (150–285°C, 0.4–7.0 MPa). The deposit under the same temperature and pressure conditions as those for BWR reactor water (285°C, 7.0 MPa) was identified as NiO by spectrum profile analysis of the NiLα, NiLβ and 9th-order NiKα1 lines. Deposition rate was obtained from in situ measurements of deposit thickness, by a photoacoustic method, and from chemical analysis of deposit amount. The deposition rate coefficients obtained in temperature and pressure ranges of 150–250°C and 0.4–4.0 MPa were 2 × 10−3–5 × 10−2, which were 0.15–0.45 times as large as those of iron crud. This was attributed to a dissolution effect of Ni ion from NiO. The deposition rate coefficient at 285°C, 7.0 MPa was estimated to be 4.4 × 10−2–1.3 × 10−1.