QCL seeded, ns-pulse, multi-line, CO2 laser oscillator for laser-produced-plasma extreme-UV source

Successful merger of state-of-the-art, semiconductor quantum-cascade lasers (QCL), with the mature CO2 laser technology, resulted in a delivery of highly-desired qualities of CO2 laser output that were not available previously without much effort. These qualities, such as multi-line operation, excellent spectro-temporal stability and pulse waveform control, became available from a single device of moderate complexity. This paper describes the operation principle and the unique properties of the solid{state seeded CO2 laser, invented for an application in laser-produced-plasma (LPP), extreme-UV (EUV) light source.

[1]  P. K. Cheo,et al.  SPONTANEOUS SELF‐PULSING AND CAVITY DUMPING IN A CO2 LASER WITH ELECTRO‐OPTIC Q‐SWITCHING , 1969 .

[2]  Krzysztof M Nowak,et al.  Solid-state seeded nano-second pulse CO2 oscillator for extreme ultraviolet lithography , 2013 .

[3]  J. Faist,et al.  Quantum Cascade Laser , 1994, Science.

[4]  Takashi Suganuma,et al.  Spectral characteristics of quantum-cascade laser operating at 10.6 μm wavelength for a seed application in laser-produced-plasma extreme UV source. , 2012, Optics letters.

[5]  Akira Sumitani,et al.  CO2 laser drives extreme ultraviolet nano-lithography — second life of mature laser technology , 2013 .

[6]  Takashi Suganuma,et al.  Multiline short-pulse solid-state seeded carbon dioxide laser for extreme ultraviolet employing multipass radio frequency excited slab amplifier. , 2013, Optics letters.

[7]  Takashi Suganuma,et al.  Synthesis of arbitrary pulse waveforms in QCL-seeded ns-pulse CO2 laser for optimization of an LPP EUV source. , 2016, Optics letters.

[8]  B. Feldman,et al.  Short-pulse multiline and multiband energy extraction in high-pressure CO 2 -laser amplifiers , 1973 .

[9]  Takashi Suganuma,et al.  Wavefront measurement of single-mode quantum cascade laser beam for seed application in laser-produced plasma extreme ultraviolet system. , 2012, Optics letters.

[10]  Tsuyoshi Yamada,et al.  Performance of new high-power HVM LPP-EUV source , 2016, SPIE Advanced Lithography.

[11]  Akira Sumitani,et al.  Efficient multiline nanosecond pulse amplification in planar waveguide CO₂ amplifier for extreme UV laser-produced plasma source. , 2014, Optics letters.