Determination of the density of the defect states in Hf0.5Zr0.5O2 high-k film Deposited by using rf-magnetron sputtering technique
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W. Lu | Yidong Xia | Jingzhou Yin | X. Ou | Zuliang Liu | Jianxin Lu | B. Xu | A. Li | X. Liu | Yanqiang Cao