A novel method for forming gate spacer and its effects on the W/WN/sub x//poly-Si gate stack
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Heung-Jae Cho | K. Lim | Yong Soo Kim | S. Jang | Jae-Geun Oh | Hong-Seon Yang | H. Sohn | Jin-Woong Kim | Jun-Mo Yang | Su-Ock Chung | J. Suh | Soo-Young Park