Fast acquisition of activation energy maps using temperature ramps for lifetime modeling of BTI
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Tibor Grasser | Katja Puschkarsky | Hans Reisinger | Christian Schlünder | Wolfgang Gustin | T. Grasser | K. Puschkarsky | H. Reisinger | W. Gustin | C. Schlünder
[1] M. Nelhiebel,et al. In Situ Poly Heater—A Reliable Tool for Performing Fast and Defined Temperature Switches on Chip , 2010, IEEE Transactions on Device and Materials Reliability.
[2] Tsuyoshi Murata,et al. {m , 1934, ACML.
[3] B. Kaczer,et al. Analytic modeling of the bias temperature instability using capture/emission time maps , 2011, 2011 International Electron Devices Meeting.
[4] T. Grasser,et al. On the Distribution of NBTI Time Constants on a Long, Temperature-Accelerated Time Scale , 2013, IEEE Transactions on Electron Devices.
[5] T. Grasser,et al. NBTI from the perspective of defect states with widely distributed time scales , 2009, 2009 IEEE International Reliability Physics Symposium.
[7] M. Nelhiebel,et al. Accurate High Temperature Measurements Using Local Polysilicon Heater Structures , 2014, IEEE Transactions on Device and Materials Reliability.
[8] T. Grasser,et al. The time dependent defect spectroscopy (TDDS) for the characterization of the bias temperature instability , 2010, 2010 IEEE International Reliability Physics Symposium.
[9] M. Denais,et al. NBTI degradation: From physical mechanisms to modelling , 2006, Microelectron. Reliab..
[10] T. Grasser,et al. Hot-Carrier Degradation and Bias-Temperature Instability in Single-Layer Graphene Field-Effect Transistors: Similarities and Differences , 2015, IEEE Transactions on Electron Devices.
[11] V. Huard. Two independent components modeling for Negative Bias Temperature Instability , 2010, 2010 IEEE International Reliability Physics Symposium.
[12] Tibor Grasser,et al. Stochastic charge trapping in oxides: From random telegraph noise to bias temperature instabilities , 2012, Microelectron. Reliab..
[13] H. Reisinger,et al. Analysis of NBTI Degradation- and Recovery-Behavior Based on Ultra Fast VT-Measurements , 2006, 2006 IEEE International Reliability Physics Symposium Proceedings.
[14] V. Huard,et al. Interface trap generation and hole trapping under NBTI and PBTI in advanced CMOS technology with a 2-nm gate oxide , 2004, IEEE Transactions on Device and Materials Reliability.
[15] P ? ? ? ? ? ? ? % ? ? ? ? , 1991 .