Ultra-thin chip technology for system-in-foil applications

A new additive ultra-thin chip fabrication process is presented, utilizing an array of vertical anchors that mechanically connect silicon membrane chips to a standard silicon wafer. The process is demonstrated down to 8 µm silicon chip thickness, with a chip thickness control better than ±0.2 µm and a surface topography with average roughness < 7 nm. Such pre-processed wafers can be used for CMOS manufacturing like any conventional silicon substrate. A wide process window with yield figures exceeding 99% is achieved by proper management of the built-in and externally applied stress on the anchors. The excellent mechanical flexibility and stability of these ultra-thin chips make them particularly suitable for system-in-foil applications.

[1]  W. Appel,et al.  A New Fabrication and Assembly Process for Ultrathin Chips , 2009, IEEE Transactions on Electron Devices.

[2]  Karlheinz Bock,et al.  Polymer Electronics Systems - Polytronics , 2005, Proceedings of the IEEE.

[3]  T. M. Michielsen,et al.  Substrate Transfer: an Enabling Technology for System-in-Package Solutions , 2006, 2006 Bipolar/BiCMOS Circuits and Technology Meeting.

[4]  Eun-Kyung Kim,et al.  Assessment of ultra-thin Si wafer thickness in 3D wafer stacking , 2010, Microelectron. Reliab..

[5]  Joachim N. Burghartz,et al.  Ultra-thin chips and related applications, a new paradigm in silicon technology , 2009, 2009 Proceedings of the European Solid State Device Research Conference.