A Novel Photosensitive Silicone Ladder Polymer: Synthesis, Photochemical, and Thermal Characteristics

A negative working photosensitive silicone ladder polymer (PVSQ) based on polyphenylsilsesquioxane with vinyl groups as a reactive substituents in the side chain, and 2,6-bis(azidobenzylidene)-4-methylcyclohexanone (BA) as a photocrosslinker, has been developed. The monodisperse PVSQ was synthesized by co-polymerization of trichlorophenylsilane and trichloro(vinyl)silane with potassium hydroxide in isobutyl methyl ketone. The PVSQ film showed excellent transparency above 280 nm and high solubility in organic solvents. The photosensitive PVSQ containing 3 wt% of BA showed the sensitivity of 40 mJ cm−2 when it was exposed to 365 nm light (i-line) followed by development with a mixture solution of anisole and xylene at 25 °C. The photosensitive PVSQ film also showed high thermal stability (decomposition temperature: 520 °C) and low dielectric constant (3.2/1 MHz), demonstrating a high potential for application to LSI production.

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