论文信息 - Mechanochemical superpolishing of diamond using NaNO3 or KNO3 as oxidizing agents

Mechanochemical superpolishing of diamond using NaNO3 or KNO3 as oxidizing agents

In the present development of diamond electronics, one needs atomically flat and damage free diamond substrates for the growth of doped and undoped homoepitaxial layers of high crystalline quality. We show that atomically flat surfaces with no damage layer below can be produced by mechanochemical superpolishing of diamond substrates using NaNO3 or KNO3 as oxidizing agents. A residual roughness of 0.2 nm rms and less is achieved independent of crystal orientation.

O. Weis | J. Kühnle | O. Weis | J. Kühnle

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