A study of the non-uniform current density influence in reactive sputtering deposition

In this work, a modeling for reactive sputtering has been presented where the non-uniform current density is taken into account. The model in this paper can be used to understand the process of reactive magnetron sputtering. The results are compared with those that assume uniform discharge current density distributed on the target. It can be concluded that the process with the non-uniform discharge density shows a higher flow of gas reactive when occurring the hysteresis behavior. In addition, a study of the radial variation of the target composition in metallic and compound mode is also performed.

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