Refractory Compositions Based on Silicon‐Boron Oxygen Reactions

The nature and properties of a novel refractory material formed by reacting silicon and boron in air are described. The resulting material consists of free silicon and a new compound, SiB, dispersed in a borosilicate matrix. This refractory is stable in air to temperatures exceeding 1550°C., is thermal-shock resistant, and has a low density.