论文信息 - ff ect of the Ligand Structure on Chemical Vapor Deposition of WN x C y Thin Films from Tungsten Nitrido Complexes of the Type WN ( NR 2 ) 3 - 字舞流文

ff ect of the Ligand Structure on Chemical Vapor Deposition of WN x C y Thin Films from Tungsten Nitrido Complexes of the Type WN ( NR 2 ) 3

R. Korotkov | L. McElwee‐White | T. Anderson | K. R. McClain | Richard O. Bonsu | Donohue | Michelle M. Nolan | A. Koley | O. ChristopherT.