论文信息 - Enhanced recrystallization and dopant activation of P+ ion-implanted super-thin Ge layers by RF hydrogen plasma treatment - 字舞流文

Enhanced recrystallization and dopant activation of P+ ion-implanted super-thin Ge layers by RF hydrogen plasma treatment

V. Lysenko | Y. Gomeniuk | R. Duffy | P. Lytvyn | A. Nazarov | I. Golentus | E. Napolitani | V. Kladko | P. N. Okholin | V. Yukhymchuk | V. I. Glotov | Sergiy B. Kryvyi