A Study of Through-Silicon-Via ( TSV ) Induced Transistor Variation by

As continued scaling becomes increasingly difficult, 3D integration has emerged as a viable solution to achieve higher bandwidth and power efficiency. Through-siliconvias (TSVs), which directly connect stacked structures die-to-die, is one of the key techniques enabling 3D integration. The process steps and physical presence of TSVs, however, may generate a stress-induced thermal mismatch between TSVs and the silicon bulk. These effects could further perturb the performance of nearby electronic structures, particularly transistors, diodes, and associated circuits. This thesis presents a comprehensive study to characterize, analyze and model the impact of TSV-induced stress impact on device and circuit performance and its interaction with polysilicon and shallow-trench-isolation (STI) layout pattern density. A test chip is designed with multiplexing test circuits providing measurements of key parameters of a large number of devices. These devices under test (DUTs) have layouts that explore a range of TSV and device layout choices in the design of experiments (DOEs). The test chip uses a scan chain approach combined with low-leakage and low-variation switches and Kelvin sensing connections, which provide access to detailed analog device characteristics in large arrays of test devices. A test circuit and an I0ff measurement method is designed to perform off-chip wafer probe testing measurement. In addition, a finite element analysis model is constructed to mimic realistic TSV structures and processes. A complete flow and methodology to analyze transistor characteristics and circuit performance under the influence of TSV stress is proposed. An efficient algorithm is also proposed to simulate full-chip circuit variation under the impact of TSV stress based on a grid partition approach. Test cases corresponding to the aforementioned test chip are simulated for comparison with measurement data. Thesis Supervisor: Duane S. Boning Title: Professor of Electrical Engineering and Computer Science

[1]  S. Thompson,et al.  Uniaxial-process-induced strained-Si: extending the CMOS roadmap , 2006, IEEE Transactions on Electron Devices.

[2]  Y. Yoshimura,et al.  Characterization of MOS transistors after TSV fabrication and 3D-assembly , 2008, 2008 2nd Electronics System-Integration Technology Conference.

[3]  Suk-kyu Ryu,et al.  Impact of Near-Surface Thermal Stresses on Interfacial Reliability of Through-Silicon Vias for 3-D Interconnects , 2011, IEEE Transactions on Device and Materials Reliability.

[4]  J. Knickerbocker,et al.  A CMOS-compatible process for fabricating electrical through-vias in silicon , 2006, 56th Electronic Components and Technology Conference 2006.

[5]  Charles S. Smith Piezoresistance Effect in Germanium and Silicon , 1954 .

[6]  K. Gettings,et al.  Study of CMOS Process Variation by Multiplexing Analog Characteristics , 2008, IEEE Transactions on Semiconductor Manufacturing.

[7]  Anantha Chandrakasan,et al.  Timing, energy, and thermal performance of three-dimensional integrated circuits , 2004, GLSVLSI '04.

[8]  R. Tummala,et al.  Failure mechanisms and optimum design for electroplated copper Through-Silicon Vias (TSV) , 2009, 2009 59th Electronic Components and Technology Conference.

[9]  H. Tu,et al.  Enabling 3D-IC foundry technologies for 28 nm node and beyond: through-silicon-via integration with high throughput die-to-wafer stacking , 2009, 2009 IEEE International Electron Devices Meeting (IEDM).

[10]  Jae-Seok Yang,et al.  TSV stress aware timing analysis with applications to 3D-IC layout optimization , 2010, Design Automation Conference.

[11]  Albert Hsu Ting Chang,et al.  A test structure for the measurement and characterization of layout-induced transistor variation , 2009 .

[12]  Uri C. Weiser,et al.  Interconnect-power dissipation in a microprocessor , 2004, SLIP '04.

[13]  G.E. Moore,et al.  Cramming More Components Onto Integrated Circuits , 1998, Proceedings of the IEEE.

[14]  H.P. Hofstee,et al.  Future microprocessors and off-chip SOP interconnect , 2004, IEEE Transactions on Advanced Packaging.

[15]  F. M. Bufler,et al.  Hole Mobility Model With Silicon Inversion Layer Symmetry and Stress-Dependent Piezoconductance Coefficients , 2009, IEEE Electron Device Letters.

[16]  A. Chandrakasan,et al.  Lack of Spatial Correlation in MOSFET Threshold Voltage Variation and Implications for Voltage Scaling , 2009, IEEE Transactions on Semiconductor Manufacturing.

[17]  Suk-kyu Ryu,et al.  Thermo-mechanical reliability of 3-D ICs containing through silicon vias , 2009, 2009 59th Electronic Components and Technology Conference.

[18]  P. Soussan,et al.  Comprehensive analysis of the impact of single and arrays of through silicon vias induced stress on high-k / metal gate CMOS performance , 2010, 2010 International Electron Devices Meeting.

[19]  J. Fossum,et al.  Comparison of threshold-voltage shifts for uniaxial and biaxial tensile-stressed n-MOSFETs , 2004, IEEE Electron Device Letters.

[20]  M. Facchini,et al.  Stackable memory of 3D chip integration for mobile applications , 2008, 2008 IEEE International Electron Devices Meeting.

[21]  D. Edelstein,et al.  Silicon Carrier with Deep Through-Vias, Fine Pitch Wiring and Through Cavity for Parallel Optical Transceiver , 2005, Proceedings Electronic Components and Technology, 2005. ECTC '05..

[22]  P. Soussan,et al.  Impact of thinning and through silicon via proximity on High-k / Metal Gate first CMOS performance , 2010, 2010 Symposium on VLSI Technology.