Fast Rotation Technique for the Formation of a Thin-Film Intermetallic Compound on a Cylindrical Metallic Substrate

A technique has been developed that allows a uniform stoichiometric thin-film compound to be formed on the outer surface of a cylindrical substrate by rapidly rotating the substrate about its longitudinal axis so that the thickness of approximately one lattice constant is deposited per revolution. Niobium and tin were vacuum evaporated simultaneously from separate sources, and bulk quality Nb3Sn films were formed over the complete substrate surface. In addition, samples were prepared of alternate layers of Nb3Sn and a second material with sharp delineation between layers. Some of the technology necessary for this method of film preparation is discussed.