论文信息 - Post-CMP Cleaning of InGaAs Surface for the Removal of Nanoparticle Contaminants for Sub-10nm Device Applications - 字舞流文

Post-CMP Cleaning of InGaAs Surface for the Removal of Nanoparticle Contaminants for Sub-10nm Device Applications

Jung-Hwan Lee | L. Teugels | Jin-Goo Park | Nagendra Prasad Yerriboina | Tae-Gon Kim | Hyun-Tae Kim | In-Chan Choi