Mass spectrometry investigation of magnetron sputtering discharges

[1]  P. Fitl,et al.  A Detailed Investigation of Radicals and Ions in ECR Methane/Argon Microwave Discharge , 2016 .

[2]  J. Musil.  Flexible hard nanocomposite coatings , 2015 .

[3]  P. Fitl,et al.  Contamination of Magnetron Sputtered Metallic Films by Oxygen From Residual Atmosphere in Deposition Chamber , 2015 .

[4]  J. Vlček,et al.  Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films , 2015 .

[5]  L. Fekete,et al.  RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges—plasma characterisation and surface morphology , 2013 .

[6]  L. Fekete,et al.  Nucleation of ultrathin silver layer by magnetron sputtering in Ar/N2 plasma , 2013 .

[7]  P. Fitl,et al.  Mass Spectrometric Characterizations of Ions Generated in RF Magnetron Discharges during Sputtering of Silver in Ne, Ar, Kr an.d Xe Gases , 2013 .

[8]  Z. Somogyvári,et al.  Sputtering yields for low-energy Ar+- and Ne+-ion bombardment , 2012 .

[9]  V. M. Donnelly,et al.  Ion energy distributions, electron temperatures, and electron densities in Ar, Kr, and Xe pulsed discharges , 2012 .

[10]  P. Kelly,et al.  Influence of inert gas species on the growth of silver and molybdenum films via a magnetron discharge , 2011 .

[11]  P. Fitl,et al.  Investigation of the Negative Ions in Ar/O2 Plasma of Magnetron Sputtering Discharge with Al:Zn Target by Ion Mass Spectrometry , 2011 .

[12]  J. Musil,et al.  Generation of Positive and Negative Oxygen Ions in Magnetron Discharge During Reactive Sputtering of Alumina , 2010 .

[13]  T. Welzel,et al.  Ion energy distributions in AZO magnetron sputtering from planar and rotatable magnetrons , 2009 .

[14]  J. Musil,et al.  Role of energy in low-temperature high-rate formation of hydrophilic TiO2 thin films using pulsed magnetron sputtering , 2007 .

[15]  P. Kelly,et al.  Substrate effects during mid-frequency pulsed DC biasing , 2001 .

[16]  M. Futsuhara,et al.  Noble gas influence on reactive radio frequency magnetron sputter deposition of TiN films , 1998 .

[17]  I. Ivanov,et al.  Comparison of magnetron sputter deposition conditions in neon, argon, krypton, and xenon discharges , 1993 .

[18]  J. Musil,et al.  Optical emission spectra from microwave oxygen plasma produced by surfatron discharge , 1993 .

[19]  T. Yuasa,et al.  Energetic Oxygen Atoms in RF Sputtering of ZnO , 1987 .

[20]  R. Moss,et al.  Modification of the grain size of sputtered copper with additions of oxygen, krypton, silver, or yttrium , 1985 .

[21]  M. Wutz,et al.  Theory and practice of vacuum technology , 1989 .