Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node
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Diederik Verkest | Aaron Thean | Julien Ryckaert | Mircea Dusa | Tom Mountsier | Min-Soo Kim | Abdelkarim Mercha | Sushil Sakhare | Dan Mocuta | Darko Trivkovic | D. Mocuta | A. Thean | J. Ryckaert | A. Mercha | D. Verkest | D. Trivkovic | M. Dusa | Min-Soo Kim | S. Sakhare | T. Mountsier
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