Spectroscopic emission studies of O2/He and N2/He plasmas in remote plasma enhanced chemical vapor deposition

We have analyzed He, O2 /He, and N2 /He plasmas of the remote plasma enhanced chemical vapor deposition of a‐Si:H, silicon oxide, and nitride deposition by emission optical spectroscopy and by mass spectrometry. We have detected species such as atomic N and O as well as metastable He. These will be discussed relative to the deposition of silicon nitrides, oxides, and amorphous silicon.