Spacer patterning lithography as a new process to induce block copolymer alignment by chemo-epitaxy
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L. Pain | X. Chevalier | R. Tiron | C. Nicolet | A. Gharbi | A. Paquet | A. Le Pennec | T. J. Giammaria | G. Rademaker | M.-L. Pourteau | D. Mariolle | C. Navarro | K. Sakavuyi | P. Nealey
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