High-quality PbZr0.52Ti0.48O3 films prepared by modified sol–gel route at low temperature

Abstract A modification of the methoxyethanol-based sol–gel route used for depositing high-quality PbZr0.52Ti0.48O3 (PZT) films at low temperature is reported. The modification consists of multiple distillations of Pb precursor after dissolving in 2-methoxyethanol and increasing the pyrolisis temperature after individual layer deposition. In addition, a large amount of PbO excess (20%) is used to maintain the stoichiometry of PZT films. As a result, the films processed at 500 °C possess a dielectric permittivity of ∼1900, a remanent polarization of ∼30 μC/cm2 and a coercive field of ∼60 kV/cm. The crystallization mechanism is discussed along with the possible applications of such films in microelectromechanical systems.