Infrared optical properties of electron-beam evaporated silicon oxynitride films.

The complex dielectric function of SiO0.6N0.2 coatings, produced by reactive electron-beam deposition, was evaluated in the 5–50-μm range. The composition was determined by Rutherford backscattering spectrometry. The IR optical properties of the films make them well suited for radiative cooling applications.

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