Effect of pore structure of nanometer scale porous films on the measured elastic modulus.

The impact of pore structure of nanoporous films on the measured elastic modulus is demonstrated for silica-based nanoporous low-k films that are fabricated using an alternative manufacturing sequence which allows a separate control of porosity and matrix properties. For this purpose, different experimental techniques for measuring the elastic properties were compared, including nanoindentation, laser-induced surface acoustic wave spectroscopy (LAwave), and ellipsometric porosimetry (EP). The link between the elastic response of these nanoporous materials and their internal pore structure was investigated using positronium annihilation lifetime spectroscopy (PALS), EP, and diffusion experiments. It is shown that the absolute value of the Berkovich indentation modulus is very sensitive to the local pore structure and stiffness of the substrate and can be influenced by densification and/or anisotropic elasticity upon indentation, while on the other hand spherical indentation results are less sensitive to the local pore structure. The comparison of Berkovich and spherical indentation results combined with finite element simulations can potentially reveal changes in the internal structure of the film. For nanoporous films with porosity above the percolation threshold, the elastic modulus results obtained with LAwave and EP agree very well with spherical indentation results. On the other hand, below the percolation threshold, the elastic modulus values determined by these techniques deviate from the spherical indentation results. This was explained in terms of specific technique related effects that appear to be sensitive to the specific arrangement and morphology of the pores.

[1]  Y. Nishi,et al.  The effect of water uptake on the mechanical properties of low-k organosilicate glass , 2013 .

[2]  E. T. Ryan,et al.  Study of viscoplastic deformation in porous organosilicate thin films for ultra low-k applications , 2013 .

[3]  Sean W. King,et al.  Mechanical properties of high porosity low-k dielectric nano-films determined by Brillouin light scattering , 2013 .

[4]  PingXIAO Haiyan Li Xiaojuan Lu Effect of densi?cation distribution on the Young's modulus of porous coatings after nano-indentation , 2012 .

[5]  Kris Vanstreels,et al.  Intrinsic effect of porosity on mechanical and fracture properties of nanoporous ultralow-k dielectrics , 2012 .

[6]  Ehrenfried Zschech,et al.  Advanced Interconnects for ULSI Technology , 2012 .

[7]  C. Detavernier,et al.  In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry. , 2012, Langmuir : the ACS journal of surfaces and colloids.

[8]  J. Bielefeld,et al.  Elastic properties of porous low-k dielectric nano-films , 2011 .

[9]  Denis Shamiryan,et al.  Improving mechanical robustness of ultralow-k SiOCH plasma enhanced chemical vapor deposition glasses by controlled porogen decomposition prior to UV-hardening , 2010 .

[10]  Kris Vanstreels,et al.  Nanoindentation study of thin plasma enhanced chemical vapor deposition SiCOH low-k films modified in He/H2 downstream plasma , 2010 .

[11]  Denis Shamiryan,et al.  Effect of Porogen Residue on Chemical, Optical, and Mechanical Properties of CVD SiCOH Low-k Materials , 2009 .

[12]  Yanshuo Li,et al.  FAU-type zeolite membranes synthesized by microwave assisted in situ crystallization , 2008 .

[13]  Karen Maex,et al.  Diffusion of solvents in thin porous films , 2007 .

[14]  Karen Maex,et al.  Dielectric Films for Advanced Microelectronics , 2007 .

[15]  Toshio Nakamura,et al.  Identification of elastic-plastic anisotropic parameters using instrumented indentation and inverse analysis , 2007 .

[16]  A. Neimark,et al.  Density functional theory model of adsorption deformation. , 2006, Langmuir : the ACS journal of surfaces and colloids.

[17]  Quoc Toan Le,et al.  Quantification of processing damage in porous low dielectric constant films , 2006 .

[18]  D. Gidley,et al.  POSITRON ANNIHILATION AS A METHOD TO CHARACTERIZE POROUS MATERIALS , 2006 .

[19]  A. C. Fischer-Cripps,et al.  Critical review of analysis and interpretation of nanoindentation test data , 2006 .

[20]  Xi Chen,et al.  Novel technique for measuring the mechanical properties of porous materials by nanoindentation , 2006 .

[21]  J. Vlassak,et al.  Mechanical properties of porous and fully dense low-κ dielectric thin films measured by means of nanoindentation and the plane-strain bulge test technique , 2006 .

[22]  C. Sanchez,et al.  Porosity and mechanical properties of mesoporous thin films assessed by environmental ellipsometric porosimetry. , 2005, Langmuir : the ACS journal of surfaces and colloids.

[23]  F. Ulm,et al.  Explicit approximations of the indentation modulus of elastically orthotropic solids for conical indenters , 2004 .

[24]  D. Shamiryan,et al.  A Discussion of the Practical Importance of Positron Annihilation Lifetime Spectroscopy Percolation Threshold in Evaluation of Porous Low-K Dielectrics , 2004 .

[25]  M. Griepentrog,et al.  Young’s modulus measurements on ultra-thin coatings , 2004 .

[26]  M. Ciavarella,et al.  The indentation modulus of elastically anisotropic materials for indenters of arbitrary shape , 2003 .

[27]  Mark R. VanLandingham,et al.  Review of Instrumented Indentation , 2003, Journal of research of the National Institute of Standards and Technology.

[28]  Karen Maex,et al.  Low dielectric constant materials for microelectronics , 2003 .

[29]  M. Baklanov,et al.  Determination of Young's Modulus of Porous Low-k Films by Ellipsometric Porosimetry , 2002 .

[30]  P. Kohl,et al.  Chemically Bonded Porogens in Methylsilsesquioxane II. Electrical, Optical, and Mechanical Properties , 2002 .

[31]  K. Lynn,et al.  Nanometer-scale pores in low-k dielectric films probed by positron annihilation lifetime spectroscopy , 2002 .

[32]  Peter Siemroth,et al.  Quality control of ultra-thin and super-hard coatings by laser-acoustics , 2002 .

[33]  M. Baklanov,et al.  N characterisation of porous low-k dielectric films , 2002 .

[34]  Shu Yang,et al.  Characterizing porosity in nanoporous thin films using positronium annihilation lifetime spectroscopy , 2003 .

[35]  Xi Chen,et al.  Numerical study on the measurement of thin film mechanical properties by means of nanoindentation , 2001 .

[36]  Alfred Grill,et al.  Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition , 2001 .

[37]  G. Pharr,et al.  Indentation of elastically anisotropic half-spaces by cones and parabolae of revolution , 2001 .

[38]  M. R. Baklanov,et al.  Determination of pore size distribution in thin films by ellipsometric porosimetry , 2000 .

[39]  F. Richter,et al.  Determination of elastic properties of thin films by indentation measurements with a spherical indenter , 2000 .

[40]  David M. Follstaedt,et al.  Finite-element modeling of nanoindentation , 1999 .

[41]  A. Neubrand,et al.  Precision measurement of the surface acoustic wave velocity on silicon single crystals using optical excitation and detection , 1994 .

[42]  D. Schneider,et al.  Determination of elastic modulus and thickness of surface layers by ultrasonic surface waves , 1992 .

[43]  G. Pharr,et al.  An improved technique for determining hardness and elastic modulus using load and displacement sensing indentation experiments , 1992 .

[44]  I. A. Viktorov Rayleigh and Lamb Waves , 1967 .