CF4/H2 Plasma Cleaning of Graphene Regenerates Electronic Properties of the Pristine Material
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D. Mariolle | D. Rouchon | D. Ferrah | H. Okuno | V. Bouchiat | N. Chevalier | O. Renault | J. Arias-Zapata | G. Cunge | D. Marinov | J. Arias‐Zapata