EUV Research at Berkeley Lab: Enabling Technologies and Applications

The tremendous progress in the development and deployment of lab scale extreme ultraviolet (EUV) sources over the past decade has opened up the door to a wide variety of new users beyond the traditional synchrotron community. The practical use of such sources, however, is heavily dependent on the availability of EUV optical components. In this manuscript, we describe recent advances at Berkeley Lab in the development of reflective and diffractive optical structures for imaging, wavefront encoding, metrology, spectral filtering, and more.

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