Evaluation of lattice strain in silicon substrate beneath aluminum conductor film using high-resolution X-ray microbeam diffractometry
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Y. Kagoshima | Y. Tsusaka | J. Matsui | S. Takeda | K. Yokoyama | N. Miyamoto | H. Kurihara | M. Urakawa | Kyoko Watanabe | M. Katou | N. Inoue