Charge pumping analysis of radiation effects in LOCOS parasitic transistors
暂无分享,去创建一个
O. Faynot | O. Flament | R. Truche | P. Paillet | R. Truche | O. Faynot | O. Flament | P. Paillet | P. Roche | J. Autran | P. Roche | J. L. Autran
[1] Guido Groeseneken,et al. The effect of externally imposed mechanical stress on the hot-carrier-induced degradation of deep-sub micron nMOSFET's , 1997 .
[2] M. White,et al. Observation of near-interface oxide traps with the charge-pumping technique , 1992, IEEE Electron Device Letters.
[3] O. Flament,et al. Radiation-induced interface traps in hardened MOS transistors: an improved charge-pumping study , 1996 .
[4] P. Winokur,et al. Simple technique for separating the effects of interface traps and trapped‐oxide charge in metal‐oxide‐semiconductor transistors , 1986 .
[5] D. Fleetwood. Fast and slow border traps in MOS devices , 1995 .
[6] G. Groeseneken,et al. A reliable approach to charge-pumping measurements in MOS transistors , 1984, IEEE Transactions on Electron Devices.
[7] Toru Toyabe,et al. Reverse short-channel effect of threshold voltage in LOCOS parasitic MOSFETs , 1995 .
[8] Daniel M. Fleetwood,et al. Border traps: issues for MOS radiation response and long-term reliability , 1995 .
[9] J. Autran,et al. Location of individual traps in DRAM cell transistors by charge pumping technique , 1997 .
[10] S. M. Hu,et al. Stress‐related problems in silicon technology , 1991 .
[11] G. Groeseneken,et al. Analysis of the charge pumping technique and its application for the evaluation of MOSFET degradation , 1989 .
[12] J. L. Pelloie,et al. Two-dimensional simulation of total dose effects on NMOSFET with lateral parasitic transistor , 1996 .
[13] J. Plummer,et al. Electrical performance and physics of isolation region structures for VLSI , 1984, IEEE Transactions on Electron Devices.