Projection micro-stereolithography using digital micro-mirror dynamic mask

Abstract We present in this paper the development of a high-resolution projection micro-stereolithography (PμSL) process by using the Digital Micromirror Device (DMD™, Texas Instruments) as a dynamic mask. This unique technology provides a parallel fabrication of complex three-dimensional (3D) microstructures used for micro electro-mechanical systems (MEMS). Based on the understanding of underlying mechanisms, a process model has been developed with all critical parameters obtained from the experimental measurement. By coupling the experimental measurement and the process model, the photon-induced curing behavior of the resin has been quantitatively studied. The role of UV doping has been thereafter justified, as it can effectively reduce the curing depth without compromising the chemical property of the resin. The fabrication of complex 3D microstructures, such as matrix, and micro-spring array, with the smallest feature of 0.6 μm, has been demonstrated.

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