论文信息 - Fully isolated lateral bipolar—MOS transistors fabricated in zone-melting-recrystallized Si films on SiO2

Fully isolated lateral bipolar—MOS transistors fabricated in zone-melting-recrystallized Si films on SiO2

A four-terminal device that can be operated either as a lateral n-p-n bipolar transistor or as a conventional n-channel MOSFET has been fabricated in silicon-on-insulator films prepared by graphite-strip-heater zone-melting recrystallization. Common-emitter current gain close to 20 and emitter-base breakdown voltage in excess of 10 V have been obtained for bipolar operation. As a MOSFET, the device exhibits well-behaved enhancement-mode characteristics with a field-effect mobility of ∼ 600 cm2/V.s and drain breakdown voltage exceeding 15 V.

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