Photoabsorption, photoionization, and neutral‐dissociation cross sections of SiF4, SiCl4, and Si(CH3)4 in the extreme‐ultraviolet range
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Ken'ichiro Tanaka | Y. Hatano | T. Numazawa | M. Ukai | N. Kouchi | N. Terazawa | Kosei. Kameta | Y. Chikahiro