Electrical Evaluation of Ru-W(-N), Ru-Ta(-N) and Ru-Mn films as Cu diffusion barriers
暂无分享，去创建一个
C. Wenzel | S. Strehle | R. Kaltofen | F. Munnik | J. Bartha | M. Knaut | B. Adolphi | Marion Geidel | U. Merkel | R. Liske | A. Preusse | H. Wojcik | V. Neumann | J. Gluch | Cornelia Krien | B. Adolphi | Rainer Kaltofen