Ultra-low temperature silicon nitride photonic integration platform.

High-quality SiNx films with controllable low stress and low optical loss are deposited at ultra-low temperature (75 °C) using inductively coupled plasma chemical vapor deposition (ICP-CVD). Two kinds of integrated photonic structures have been demonstrated that exemplify its viability as a photonic integration platform. A microcavity consists of two distributed Bragg reflectors (DBR) formed by alternating a total of 49 layers of SiNx and SiO2 with a total thickness of about 11.5 μm is grown without any cracks, confirming the excellent stress control in the process. Microring resonators are also fabricated in as-deposited planar SiNx waveguide layer using electron-beam lithography (EBL) and plasma etching. Average waveguide loss of 0.79 ± 0.22 dB/cm has been achieved in the range of 1550-1600 nm for ring radii larger than 40 μm. The ultra-low temperature grown SiNx with properties of low loss and low stress is therefore a promising photonic integration platform for various photonic integration applications.

[1]  R. Morandotti,et al.  New CMOS-compatible platforms based on silicon nitride and Hydex for nonlinear optics , 2013, Nature Photonics.

[2]  Florian Merget,et al.  Silicon nitride CMOS-compatible platform for integrated photonics applications at visible wavelengths. , 2013, Optics express.

[3]  T. Karabacak,et al.  Growth front roughening in silicon nitride films by plasma-enhanced chemical vapor deposition , 2002 .

[4]  A. G. Noskov,et al.  Correlation between stress and structure in chemically vapour deposited silicon nitride films , 1988 .

[5]  S. Xiao,et al.  Modeling and measurement of losses in silicon-on-insulator resonators and bends. , 2007, Optics express.

[6]  Kazuhiro Ikeda,et al.  Thermal and Kerr nonlinear properties of plasma-deposited silicon nitride/ silicon dioxide waveguides. , 2008, Optics express.

[7]  Michal Lipson,et al.  High confinement micron-scale silicon nitride high Q ring resonator. , 2009, Optics express.

[8]  Pao Tai Lin,et al.  Low‐Stress Silicon Nitride Platform for Mid‐Infrared Broadband and Monolithically Integrated Microphotonics , 2013 .

[9]  D. Thourhout,et al.  From fabrication to mode mapping in silicon nitride microdisks with embedded colloidal quantum dots , 2012 .

[10]  Hengjing Tang,et al.  Interface property of silicon nitride films grown by inductively coupled plasma chemical vapor deposition and plasma enhanced chemical vapor deposition on In0.82Al0.18As , 2015 .

[11]  C. Wilkinson,et al.  Low-Hydrogen-Content Silicon Nitride Deposited at Room Temperature by Inductively Coupled Plasma Deposition , 2006 .

[12]  Shiyang Zhu,et al.  Silicon nitride based plasmonic components for CMOS back-end-of-line integration. , 2013, Optics express.

[13]  S. Xiao,et al.  Compact silicon microring resonators with ultra-low propagation loss in the C band. , 2007, Optics express.

[14]  Y. Konishi,et al.  The structures of highly transparent, water impermeable SiNx films prepared using surface-wave-plasma chemical vapor deposition for organic light-emitting displays , 2015 .

[15]  J. Bowers,et al.  Heterogeneous lasers and coupling to Si₃N₄ near 1060 nm. , 2014, Optics letters.

[16]  C. Li,et al.  High efficiency silicon nitride grating coupler , 2013, Applied Physics A.

[17]  Fundamental properties of a-SiNx:H thin films deposited by ICP-PECVD for MEMS applications , 2013 .

[18]  G. Lo,et al.  Low propagation loss SiN optical waveguide prepared by optimal low-hydrogen module. , 2008, Optics express.

[19]  J. Aarnio,et al.  Birefringence control and dispersion characteristics of silicon oxynitride optical waveguides , 1991 .

[20]  John E. Bowers,et al.  Low-Loss Silicon Nitride AWG Demultiplexer Heterogeneously Integrated With Hybrid III–V/Silicon Photodetectors , 2014, Journal of Lightwave Technology.

[21]  A. Lui,et al.  Propagation losses of silicon nitride waveguides in the near-infrared range , 2005 .

[22]  Hongtao Lin,et al.  Integrated flexible chalcogenide glass photonic devices , 2014, Nature Photonics.