论文信息 - Sub-wavelength structure for anti-reflection fabricated by fast atom beam etching

Sub-wavelength structure for anti-reflection fabricated by fast atom beam etching

We fabricated two-dimensional sub-wavelength structured (SWS) surfaces on crystal silicon (Si) and gallium aluminum arsenide (GaAlAs) substrates. The SWS surfaces had 150-200 nm period tapered gratings. In visible wavelength, the reflectivities decreased drastically on the SWS surfaces.

K. Hane | Y. Kanamori

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