On the additivity of generation-recombination spectra. Part 3: The McWhorter model for 1/f noise in MOSFETs

Abstract This is a critical study on the McWhorter model, taking into account the conditions for additivity of GR spectra. A major finding is that the model does indeed give 1/f spectra. The calculated α -values agree with experimental values of MOSFETs in strong inversion. A simple comparison of experimental α -values with values calculated from a Δ μ -model or a McWhorter Δ n -model does not allow us to decide which the correct noise source is. However, the dependence of α on the gate voltage has often been used as a criterion for the correct source. Nevertheless, the V GT -dependence does not lead to unambiguous conclusions either.

[1]  L. Vandamme,et al.  noise in series resistance of LDD MOSTs , 1992 .

[2]  T. Kleinpenning,et al.  Relation between variance and sample duration of 1/f noise signals , 1988 .

[3]  L.K.J. Vandamme,et al.  Bulk and surface 1/f noise , 1989 .

[4]  Zeynep Celik-Butler,et al.  Determination of Si-SiO/sub 2/ interface trap density by 1/f noise measurements , 1988 .

[5]  F. Hooge 1/f noise sources , 1994 .

[6]  G. Guegan,et al.  Static and low frequency noise characterization in surface- and buried-mode 0.1 μm PMOSFETS , 2003 .

[7]  L.K.J. Vandamme,et al.  noise in MOSFET as a diagnostic tool , 1992 .

[8]  S. Haendler,et al.  Low frequency noise and hot-carrier reliability in advanced SOI MOSFETs , 2004 .

[9]  F. Stern,et al.  Properties of Semiconductor Surface Inversion Layers in the Electric Quantum Limit , 1967 .

[10]  Peter Russer,et al.  Low phase noise design of microwave oscillators (invited article) , 1996 .

[11]  L.K.J. Vandamme,et al.  Experimental studies on 1/f noise , 1981 .

[12]  G. G. Bloodworth,et al.  Measurement of current noise in m.o.s. transistors from 5×10 -5 to 1 Hz , 1968 .

[13]  Andrew G. Glen,et al.  APPL , 2001 .

[14]  F. Hooge On the additivity of generation-recombination spectra. Part 2: 1/f noise , 2003 .

[15]  G. Baccarani,et al.  Transconductance degradation in thin-Oxide MOSFET's , 1983, IEEE Transactions on Electron Devices.

[16]  E. P. Vandamme,et al.  Diagnostics of the quality of MOSFETs , 1996 .

[17]  M. Surdin,et al.  Fluctuations de courant thermionique et le « Flicker effect » , 1939 .

[18]  L. Risch,et al.  DC and low-frequency noise characteristics of SiGe p-channel FETs designed for 0.13-/spl mu/m technology , 1999 .

[19]  C. Moglestue,et al.  Self‐consistent calculation of electron and hole inversion charges at silicon–silicon dioxide interfaces , 1986 .

[20]  G. Ghibaudo,et al.  Has SiGe lowered the noise in transistors , 2002 .

[21]  M. Weissman,et al.  1/f noise in silicon wafers , 1982 .

[22]  L.K.J. Vandamme,et al.  1/f noise in MOS devices, mobility or number fluctuations? , 1994 .

[23]  L.K.J. Vandamme,et al.  Annealing of ion‐implanted resistors reduces the 1/ f noise , 1986 .

[24]  David K. Ferry,et al.  Modeling of quantum effects in ultrasmall FD-SOI MOSFETs with effective potentials and three-dimensional Monte Carlo , 2002 .

[25]  Gerard Ghibaudo,et al.  Improved Analysis of Low Frequency Noise in Field‐Effect MOS Transistors , 1991 .

[26]  F. Hooge,et al.  On generation-recombination noise , 1993 .

[27]  R. Clevers,et al.  Volume and temperature dependence of the 1f noise parameter α in Si , 1989 .

[28]  L.K.J. Vandamme,et al.  On the calculation of 1/f noise of contacts , 1976 .

[29]  On the additivity of generation–recombination spectra. Part 1: Conduction band with two centres , 2002 .