D-77 Elastic Properties of Metallic Thin Films: 2D Synchrotron XRD Analysis and in Situ Tensile Testing

Elastic behavior of thin films studied from in situ loading of the specimen during X-ray diffraction on a synchrotron source is presented. Model nanometric multilayer W/Au systems exhibiting different microstructures were analyzed. These films are supported by a (thin) polyimide substrate. X-ray diffraction in transmission geometry was used to study the deformations of both phases as a function of applied load. This geometry was developed with the aim of optimizing experiment time. Using 2D detectors and dynamical loading, measuring time is reduced considerably, down to a few hours compared to a one-week experiment in a laboratory. Furthermore, the in-plane strain state is measured in all directions with great