Debris elimination in a droplet‐target laser‐plasma soft x‐ray source

A tabletop high‐brightness line‐emitting laser‐plasma soft x‐ray source utilizing single microscopic droplets as target is shown to produce several orders of magnitude less debris than conventional‐target sources. Quantitative measurements of debris deposition rates and x‐ray flux at different directions around the droplet plasma are presented. With ethanol droplets and a 10 Hz, 70 mJ/pulse laser, typically ∼1×1012 photons/(sr⋅pulse⋅line) are emitted from the C V and C VI lines in the water window. The debris deposition is further reduced with a small, localized gas jet shield, which is transparent to the x‐rays. The deposition rate through the gas shield has been determined to be ∼0.2 pg/(sr⋅pulse). Thus, this droplet‐target laser‐plasma x‐ray source is four orders‐of‐magnitude cleaner than a low‐debris plastic tape target laser plasma of similar brightness, making it useful for x‐ray microscopy and lithography.

[1]  M. Kühne,et al.  Soft x-ray radiation from laser-produced plasmas: characterization of radiation emission and its use in x-ray lithography. , 1988, Applied optics.

[2]  Issues of laser plasma sources for soft x-ray projection lithography , 1994 .

[3]  J Z Zhang,et al.  Laser-induced breakdown in large transparent water droplets. , 1988, Applied optics.

[4]  M. Kado,et al.  Source characterization for x-ray proximity lithography. , 1994, Optics letters.

[5]  M. Ginter,et al.  Debris and VUV emission from a laser-produced plasma operated at 150 Hz using a krypton fluoride laser. , 1988, Applied optics.

[6]  P. K. Carroll,et al.  Repetitively pulsed-plasma soft x-ray source. , 1984, Applied optics.

[7]  R. Feder,et al.  Nondestructive single-shot soft x-ray lithography and contact microscopy using a laser-produced plasma source. , 1987, Applied optics.

[8]  Hans M. Hertz,et al.  Debris-free Single-line Laser-plasma X-ray Source For Microscopy , 1995 .

[9]  J. Fulghum Determination of overlayer thickness by angle-resolved XPS: A comparison of algorithms , 1993 .

[10]  Natale M. Ceglio,et al.  Soft x‐ray projection lithography , 1990 .

[11]  W. Spicer,et al.  The probing depth in photoemission and auger-electron spectroscopy , 1974 .

[12]  Hans M. Hertz,et al.  Droplet target for low-debris laser-plasma soft X-ray generation , 1993 .

[13]  Takayasu Mochizuki,et al.  Soft x‐ray emission from ω0, 2ω0, and 4ω0 laser‐produced plasmas , 1986 .

[14]  Gregory J. Tallents,et al.  Performance optimization of a high-repetition-rate KrF laser plasma x-ray source for microlithography , 1992 .

[15]  Graeme Morrison,et al.  X-Ray Microscopy III , 1992 .

[16]  P D Rockett,et al.  Prototype high-speed tape target transport for a laser plasma soft-x-ray projection lithography source. , 1993, Applied optics.

[17]  M Richardson,et al.  Characterization and control of laser plasma flux parameters for soft-x-ray projection lithography. , 1993, Applied optics.