RF Potential of a 0 . 18-m CMOS Logic Device Technology

The radio-frequency (rf) performance of a 0.18m CMOS logic technology is assessed by evaluating the cutoff and maximum oscillation frequencies( and max) the minimum noise figure ( min) and associated power gain( ) and the 1/ -noise of the devices. Gate-biasing and channel-length and gate-finger-length adjustments are identified as means to optimize the rf performance without any technology process modifications. Changing to N2O gate dielectrics is shown to greatly reduce the 1/ noise without sacrificing the ac performance. The power amplifier characteristics of CMOS at low power levels are also discussed.

[1]  C. A. Liechti,et al.  Microwave Field-Effect Transistors--1976 , 1976 .

[2]  H. Fukui Optimal noise figure of microwave GaAs MESFET's , 1979, IEEE Transactions on Electron Devices.

[3]  H. Grubin The physics of semiconductor devices , 1979, IEEE Journal of Quantum Electronics.

[4]  D.C. Shaver Microwave operation of submicrometer channel-length Silicon MOSFET's , 1985, IEEE Electron Device Letters.

[5]  D. A. Fraser,et al.  The physics of semiconductor devices , 1986 .

[6]  Constraints in p-channel device engineering for submicron CMOS technologies , 1988, Technical Digest., International Electron Devices Meeting.

[7]  L.E. Larson,et al.  A deep-submicrometer microwave/digital CMOS/SOS technology , 1991, IEEE Electron Device Letters.

[8]  A.L. Caviglia,et al.  Microwave performance of SOI n-MOSFETs and coplanar waveguides , 1991, IEEE Electron Device Letters.

[9]  R.R. Siergiej,et al.  MICROX-an all-silicon technology for monolithic microwave integrated circuits , 1993, IEEE Electron Device Letters.

[10]  D. Fleetwood,et al.  Effects of oxide traps, interface traps, and ‘‘border traps’’ on metal‐oxide‐semiconductor devices , 1993 .

[11]  R.R.J. Vanoppen,et al.  The high-frequency analogue performance of MOSFETs , 1994, Proceedings of 1994 IEEE International Electron Devices Meeting.

[12]  I. Lagnado,et al.  Microwave performance of optically fabricated T-gate thin film silicon-on-sapphire based MOSFET's , 1995, IEEE Electron Device Letters.

[13]  S. P. Voinigescu,et al.  An assessment of the state-of-the-art 0.5 /spl mu/m bulk CMOS technology for RF applications , 1995, Proceedings of International Electron Devices Meeting.

[14]  E. Morifuji,et al.  High-frequency AC characteristics of 1.5 nm gate oxide MOSFETs , 1996, International Electron Devices Meeting. Technical Digest.

[15]  A. A. Abidi,et al.  CMOS-only rf and baseband circuits for a monolithic 900 MHz wireless transceiver , 1996, Proceedings of the 1996 BIPOLAR/BiCMOS Circuits and Technology Meeting.

[16]  D. Hisamoto,et al.  Silicon RF devices fabricated by ULSI processes featuring 0.1-/spl mu/m SOI-CMOS and suspended inductors , 1996, 1996 Symposium on VLSI Technology. Digest of Technical Papers.

[17]  T. Ohguro 0.2μm analog CMOS with very low noise figure at 2GHz operation , 1996 .

[18]  Denis Flandre,et al.  A low-voltage, low-power microwave SOI MOSFET , 1996, 1996 IEEE International SOI Conference Proceedings.

[19]  W. Budde,et al.  SOI-CMOS technology with monolithically integrated active and passive RF devices on high resistivity SIMOX substrates , 1996, 1996 IEEE International SOI Conference Proceedings.

[20]  K. Jenkins,et al.  Integrated RF components in a SiGe bipolar technology , 1997 .

[21]  H. Wong,et al.  CMOS scaling into the nanometer regime , 1997, Proc. IEEE.

[22]  D. Lamey,et al.  Silicon RF-GCMOS IC technology for RF mixed-mode wireless applications , 1997, 1997 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium. Digest of Technical Papers.

[23]  T. Monk,et al.  Comprehensive study on AC characteristics in SOI MOSFETs for analog applications , 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).

[24]  Hiroshi Iwai,et al.  High performance RF characteristics of raised gate/source/drain CMOS with Co salicide , 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).

[25]  M. Soyuer,et al.  SiGe power HBT's for low-voltage, high-performance RF applications , 1998, IEEE Electron Device Letters.

[26]  Shoji Otaka,et al.  RF noise in 1.5 nm gate oxide MOSFETs and the evaluation of the NMOS LNA circuit integrated on a chip , 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).