RF Potential of a 0 . 18-m CMOS Logic Device Technology
暂无分享,去创建一个
M. Hargrove | E. Nowak | K. Jenkins | R. Groves | J. Burghartz | R. Logan | C. Webster | M. Keene
[1] C. A. Liechti,et al. Microwave Field-Effect Transistors--1976 , 1976 .
[2] H. Fukui. Optimal noise figure of microwave GaAs MESFET's , 1979, IEEE Transactions on Electron Devices.
[3] H. Grubin. The physics of semiconductor devices , 1979, IEEE Journal of Quantum Electronics.
[4] D.C. Shaver. Microwave operation of submicrometer channel-length Silicon MOSFET's , 1985, IEEE Electron Device Letters.
[5] D. A. Fraser,et al. The physics of semiconductor devices , 1986 .
[6] Constraints in p-channel device engineering for submicron CMOS technologies , 1988, Technical Digest., International Electron Devices Meeting.
[7] L.E. Larson,et al. A deep-submicrometer microwave/digital CMOS/SOS technology , 1991, IEEE Electron Device Letters.
[8] A.L. Caviglia,et al. Microwave performance of SOI n-MOSFETs and coplanar waveguides , 1991, IEEE Electron Device Letters.
[9] R.R. Siergiej,et al. MICROX-an all-silicon technology for monolithic microwave integrated circuits , 1993, IEEE Electron Device Letters.
[10] D. Fleetwood,et al. Effects of oxide traps, interface traps, and ‘‘border traps’’ on metal‐oxide‐semiconductor devices , 1993 .
[11] R.R.J. Vanoppen,et al. The high-frequency analogue performance of MOSFETs , 1994, Proceedings of 1994 IEEE International Electron Devices Meeting.
[12] I. Lagnado,et al. Microwave performance of optically fabricated T-gate thin film silicon-on-sapphire based MOSFET's , 1995, IEEE Electron Device Letters.
[13] S. P. Voinigescu,et al. An assessment of the state-of-the-art 0.5 /spl mu/m bulk CMOS technology for RF applications , 1995, Proceedings of International Electron Devices Meeting.
[14] E. Morifuji,et al. High-frequency AC characteristics of 1.5 nm gate oxide MOSFETs , 1996, International Electron Devices Meeting. Technical Digest.
[15] A. A. Abidi,et al. CMOS-only rf and baseband circuits for a monolithic 900 MHz wireless transceiver , 1996, Proceedings of the 1996 BIPOLAR/BiCMOS Circuits and Technology Meeting.
[16] D. Hisamoto,et al. Silicon RF devices fabricated by ULSI processes featuring 0.1-/spl mu/m SOI-CMOS and suspended inductors , 1996, 1996 Symposium on VLSI Technology. Digest of Technical Papers.
[17] T. Ohguro. 0.2μm analog CMOS with very low noise figure at 2GHz operation , 1996 .
[18] Denis Flandre,et al. A low-voltage, low-power microwave SOI MOSFET , 1996, 1996 IEEE International SOI Conference Proceedings.
[19] W. Budde,et al. SOI-CMOS technology with monolithically integrated active and passive RF devices on high resistivity SIMOX substrates , 1996, 1996 IEEE International SOI Conference Proceedings.
[20] K. Jenkins,et al. Integrated RF components in a SiGe bipolar technology , 1997 .
[21] H. Wong,et al. CMOS scaling into the nanometer regime , 1997, Proc. IEEE.
[22] D. Lamey,et al. Silicon RF-GCMOS IC technology for RF mixed-mode wireless applications , 1997, 1997 IEEE Radio Frequency Integrated Circuits (RFIC) Symposium. Digest of Technical Papers.
[23] T. Monk,et al. Comprehensive study on AC characteristics in SOI MOSFETs for analog applications , 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).
[24] Hiroshi Iwai,et al. High performance RF characteristics of raised gate/source/drain CMOS with Co salicide , 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).
[25] M. Soyuer,et al. SiGe power HBT's for low-voltage, high-performance RF applications , 1998, IEEE Electron Device Letters.
[26] Shoji Otaka,et al. RF noise in 1.5 nm gate oxide MOSFETs and the evaluation of the NMOS LNA circuit integrated on a chip , 1998, 1998 Symposium on VLSI Technology Digest of Technical Papers (Cat. No.98CH36216).