CVD of thin titanium dioxide films using hexanuclear titanium oxo carboxylate isopropoxides

[1]  Ming-hua Zhou,et al.  Preparation of photocatalytic TiO2 coatings of nanosized particles on activated carbon by AP-MOCVD , 2005 .

[2]  Nobuyuki Imaishi,et al.  Characterization of a TiO2 photocatalyst film deposited by CVD and its photocatalytic activity , 2005 .

[3]  A. Wojtczak,et al.  Structural and thermal stability studies of Ti(IV) hexanuclear oxo trimethylacetato isopropoxide complex , 2004 .

[4]  M. Karpińska,et al.  Reductive carbonylation of nitrobenzene over Pd/Fe/I2/Py and Pd/C/Fe/I2/Py catalytic systems , 2004 .

[5]  Mikko Ritala,et al.  Atomic Layer Deposition of Photocatalytic TiO2 Thin Films from Titanium Tetramethoxide and Water , 2004 .

[6]  K. Woo,et al.  Efficient incorporation of the Ti component with a novel titanium diolate complex in the CVD of Ba1-xSrxTiO3 thin films , 2004 .

[7]  Hans-Werner Schmidt,et al.  Fully Vapor-Deposited Thin-Layer Titanium Dioxide Solar Cells , 2002 .

[8]  H. Chae,et al.  Growth of TiO2 thin films on Si(100) and Si(111) substrates using single molecular precursor by high-vacuum MOCVD and comparison of growth behavior and structural properties , 2002 .

[9]  M. Ritala,et al.  Reaction mechanism studies on titanium isopropoxide-water atomic layer deposition process , 2002 .

[10]  M. Khakani,et al.  High-k titanium silicate dielectric thin films grown by pulsed-laser deposition , 2002 .

[11]  D. Muller,et al.  Atomic scale measurements of the interfacial electronic structure and chemistry of zirconium silicate gate dielectrics , 2001 .

[12]  Doo Jin Choi,et al.  Effects of thermally induced anatase-to-rutile phase transition in MOCVD-grown TiO2 films on structural and optical properties , 2001 .

[13]  M. Schuisky,et al.  Atomic Layer Deposition of Thin Films Using O2 as Oxygen Source , 2001 .

[14]  I. Igumenov,et al.  Thermal behavior of Ti(dpm)2(OiPr)2 vapors , 2001 .

[15]  Mikko Ritala,et al.  Atomic Layer Deposition of Titanium Oxide from TiI4 and H2O2 , 2000 .

[16]  Jeffrey T. Roberts,et al.  Observation of precursor control over film stoichiometry during the chemical vapor deposition of amorphous TixSi1-xO2 films , 2000 .

[17]  M. Schuisky,et al.  Atomic Layer Chemical Vapor Deposition of TiO2 Low Temperature Epitaxy of Rutile and Anatase , 2000 .

[18]  J. Boo,et al.  Growth of TiO2 thin films on Si(100) substrates using single molecular precursors by metal organic chemical vapor deposition , 2000 .

[19]  E. Szłyk,et al.  AuI and AgI Complexes with Tertiary Phosphines and Perfluorinated Carboxylates as Precursors for CVD of Gold and Silver , 2000 .

[20]  P. Rohr,et al.  Plasma CVD of Ultrathin TiO2 Films on Powders in a Circulating Fluidized Bed , 2000 .

[21]  Mark A. Rodriguez,et al.  Neo‐pentoxide Precursors for MOCVD Thin Films of TiO2 and ZrO2 , 2000 .

[22]  M. Schuisky,et al.  Epitaxial growth of TiO2 (rutile) thin films by halide CVD , 1999 .

[23]  Jeffrey T. Roberts,et al.  Does Chemistry Really Matter in the Chemical Vapor Deposition of Titanium Dioxide? Precursor and Kinetic Effects on the Microstructure of Polycrystalline Films , 1999 .

[24]  Robert M. Wallace,et al.  ELECTRICAL PROPERTIES OF HAFNIUM SILICATE GATE DIELECTRICS DEPOSITED DIRECTLY ON SILICON , 1999 .

[25]  T. Hirai,et al.  Microstructure and optical properties of amorphous TiO2-SiO2 composite films synthesized by helicon plasma sputtering , 1999 .

[26]  T. Boyle,et al.  Formic Acid Modified Ti(OCHMe(2))(4). Syntheses, Characterization, and X-ray Structures of Ti(4)(&mgr;(4)-O)(&mgr;-O)(OFc)(2)(&mgr;-OR)(4)(OR)(6) and Ti(6)(&mgr;(3)-O)(6)(OFc)(6)(OR)(6) (OFc = O(2)CH; OR = OCHMe(2)). , 1998, Inorganic chemistry.

[27]  M. Daglish,et al.  Decomposition of Coordinated Acetylacetonate in Lead Zirconate Titanate (PZT) Precursor Solutions , 1998 .

[28]  J. Bartlett,et al.  X-ray Structure and Raman Spectrum of [Ti(4)(&mgr;(3)-O)(2)(&mgr;(2)-O(i)()Pr)(2)(O(i)()Pr)(8)(acac)(2)]: Presence of a Ti(4)(&mgr;(3)-O)(2)(&mgr;(2)-O(i)()Pr)(2) Ladder-like Core. , 1998, Inorganic chemistry.

[29]  J. Grunwaldt,et al.  Preparation and characterization of thin TiO2-films on gold/mica , 1997 .

[30]  K. No,et al.  Effects of process parameters on titanium dioxide thin film deposited using ECR MOCVD , 1996 .

[31]  W. S. Rees CVD of nonmetals , 1996 .

[32]  J. Yates,et al.  Photocatalysis on TiO2 Surfaces: Principles, Mechanisms, and Selected Results , 1995 .

[33]  Anders Hagfeldt,et al.  Light-Induced Redox Reactions in Nanocrystalline Systems , 1995 .

[34]  T. Kamada,et al.  Structure and Properties of Silicon Titanium Oxide Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Method , 1991 .

[35]  S. M. Melpolder,et al.  Phase transformations in TiO2/SiO2 sol-gel films as a function of composition and heat-treatment , 1991, Journal of Materials Science.

[36]  Timothy Hughbanks,et al.  Structural-electronic relationships in inorganic solids: powder neutron diffraction studies of the rutile and anatase polymorphs of titanium dioxide at 15 and 295 K , 1987 .

[37]  R. McPherson,et al.  The relationship between the mechanism of formation, microstructure and properties of plasma-sprayed coatings , 1981 .