Texture Morphology of SnO2:F Films and Cell Reflectance

The texture formation on the surface of SnO2:F films was carried out using a four component CVD reaction system with tin tetrachloride as a main source. The texture up to about 30% in terms of the haze value could be formed by selecting CVD parameters. It was found in the transmission measurement of hazy SnO2:F films that a part of incident light escaped from the cut edges of the glass substrate even if the integration sphere was used. A nondestructive immersion method is proposed. This enables more exact evaluation of light quantity effectively transmitted to the active part of the a-Si solar cell when it is combined with the reflectance measurement of a pseudocell. It was also found that the reflectance of pseudocells decreased as the haze value increased, and as the shape of grains became sharper when the haze values were similar.