CPL mask technology for sub-100-nm contact hole imaging
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Kevin D. Lucas | Christopher J. Progler | J. Fung Chen | Robert J. Socha | Douglas J. Van Den Broeke | Kurt E. Wampler | Thomas L. Laidig | Bryan S. Kasprowicz | Willard E. Conley | Lloyd C. Litt | Patrick K. Montgomery | Wei Wu | Bernard J. Roman | Michael E. Hathorn
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