Stability and Control Performance Analysis of Double EWMA Controller With Metrology Delay
暂无分享,去创建一个
Gen-Ke Yang | Chang-Chun Pan | Moon-Sang Lee | Qing-Song Gong | Changchun Pan | Qingsong Gong | Genke Yang | Moon-sang Lee
[1] Sheng-Tsaing Tseng,et al. Statistical design of double EWMA controller , 2002 .
[2] Arnon M. Hurwitz,et al. Run-to-Run Process Control: Literature Review and Extensions , 1997 .
[3] Fan-Tien Cheng,et al. Run-to-Run Control Utilizing Virtual Metrology With Reliance Index , 2013, IEEE Transactions on Semiconductor Manufacturing.
[4] Armann Ingolfsson,et al. Run by run process control: combining SPC and feedback control , 1995 .
[5] Fugee Tsung,et al. Smith–EWMA run-to-run control schemes for a process with measurement delay , 2009 .
[6] Junghui Chen,et al. PLS based dEWMA run-to-run controller for MIMO non-squared semiconductor processes , 2007 .
[7] S. W. Butler,et al. Supervisory run-to-run control of polysilicon gate etch using in situ ellipsometry , 1994 .
[8] S. Tseng,et al. A study on a multivariate EWMA controller , 2002 .
[9] ENRIQUE DEL CASTILLO. Long run and transient analysis of a double EWMA feedback controller , 1999 .
[10] Armann Ingolfsson,et al. Stability and Sensitivity of an EWMA Controller , 1993 .
[11] Shu-Kai S. Fan,et al. Multiple-input multiple-output double exponentially weighted moving average controller using partial least squares , 2010 .
[12] Enrique Del Castillo,et al. AN ANALYSIS AND MIMO EXTENSION OF A DOUBLE EWMA RUN-TO-RUN CONTROLLER FOR NON-SQUARED SYSTEMS , 2003 .
[13] Duane S. Boning,et al. Run by run advanced process control of metal sputter deposition , 1998, ICMTS 1998.
[14] R.P. Good,et al. On the stability of MIMO EWMA run-to-run controllers with metrology delay , 2006, IEEE Transactions on Semiconductor Manufacturing.
[15] S. Adivikolanu,et al. Extensions and performance/robustness tradeoffs of the EWMA run-to-run controller by using the internal model control structure , 2000 .
[16] Wei Wu,et al. Double EWMA controller using neural network-based tuning algorithm for MIMO non-squared systems , 2011 .
[17] Francis J. Doyle,et al. Survey on iterative learning control, repetitive control, and run-to-run control , 2009 .
[18] Enrique Del Castillo,et al. A multivariate double EWMA process adjustment scheme for drifting processes , 2002, IIE Transactions.
[19] Shi-Shang Jang,et al. Performance Analysis of EWMA Controllers Subject to Metrology Delay , 2008, IEEE Transactions on Semiconductor Manufacturing.
[20] Ruey-Shan Guo,et al. Age-based double EWMA controller and its application to CMP processes , 2001 .
[21] Duane S. Boning,et al. Run by run control of chemical-mechanical polishing , 1995, Seventeenth IEEE/CPMT International Electronics Manufacturing Technology Symposium. 'Manufacturing Technologies - Present and Future'.
[22] James Moyne,et al. Virtual metrology and feedback control for semiconductor manufacturing processes using recursive partial least squares , 2008 .
[23] Sheng-Tsaing Tseng,et al. Stability and performance of a double MEWMA controller for drifted MIMO systems , 2008 .
[24] S. J. Qin,et al. Stability analysis of double EWMA run-to-run control with metrology delay , 2002, Proceedings of the 2002 American Control Conference (IEEE Cat. No.CH37301).
[25] S.J. Qin,et al. Recursive least squares estimation for run-to-run control with metrology delay and its application to STI etch process , 2005, IEEE Transactions on Semiconductor Manufacturing.
[26] D.M. Tilbury,et al. An Approach for Factory-Wide Control Utilizing Virtual Metrology , 2007, IEEE Transactions on Semiconductor Manufacturing.
[27] Shi-Shang Jang,et al. A MIMO R2R control using data-driven gain scheduling , 2011 .