论文信息 - Spectroscopy, actinometry, and simulation of a DC discharge in CO/H2 gas mixtures

Spectroscopy, actinometry, and simulation of a DC discharge in CO/H2 gas mixtures

We have studied the gas heating and dissociation processes in the direct current (DC) discharge CVD reactor with the closed gas circuit where the working gas mixture is used repeatedly by circulation through the discharge area. Experiments were carried out in mixtures of CO with hydrogen at overall gas pressure of 20 kPa and gas flow up to 40 m/s. The discharge plasma was analyzed by actinometry and optical emission spectroscopy. Twodimensional model of DC discharge CVD reactor has been used to study reactive gas flow, electrodynamics and surface processes. The 2D calculations show that the most important radical production reactions are the CO and H2 dissociation due to electron impact. Calculated results are compared with the experimental ones.

[1] J. Amorim,et al. Validity of actinometry to measure N and H atom concentration in N2-H2 direct current glow discharges , 1999 .

[2] J. Meek,et al. Electrical breakdown of gases , 1953 .

[3] M. Frenklach. The role of hydrogen in vapor deposition of diamond , 1989 .

[4] A. Rousseau,et al. Microwave discharge in H2: influence of H-atom density on the power balance , 1994 .

[5] N. Suetin,et al. Two-dimensional model of reactive gas flow in a diamond film CVD reactor , 1995 .

[6] J. Lawler,et al. An experimental comparison of rotational temperature and gas kinetic temperature in a discharge , 1996 .

[7] D. C. Cartwright,et al. Excitation cross sections for krypton by electrons in the 15-100-eV impact-energy range , 1981 .

[8] M. Aymar,et al. Theoretical transition probabilities and lifetimes in Kr I and Xe I spectra , 1978 .

[9] Y. Catherine,et al. Optical emission spectroscopy for diagnostic and monitoring of CH4 plasmas used for a-C : H deposition , 1990 .

[10] G. Herzberg,et al. Molecular Spectra and Molecular Structure , 1992 .

[11] Steven Frederick Durrant,et al. An actinometric study of C2H2 plasma polymerization and film properties , 1995 .

[12] F. E. Fajen,et al. Electron-impact excitation of the argon atom , 1973 .