Correction of Critical Dimension Uniformity on a Wafer by Controlling Back-Surface Transmittance Distribution of a Photomask
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Sung-Woon Choi | Jong Rak Park | Byung-Cheol Cha | Jin-Hong Park | Dong Gun Lee | Soon-ho Kim | Seong-Yoon Kim | Sung-Woon Choi | Soon-ho Kim | Jong-Rak Park | Jinhong Park | Seong-Yoon Kim | Byung-Cheol Cha
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