Materials characterization of ZrO2–SiO2 and HfO2–SiO2 binary oxides deposited by chemical solution deposition
暂无分享,去创建一个
[1] G. Lucovsky,et al. Microscopic model for enhanced dielectric constants in low concentration SiO2-rich noncrystalline Zr and Hf silicate alloys , 2000 .
[2] S. Honda,et al. Surface, structural and optical properties of sol-gel derived HfO2 films , 2000 .
[3] A. Larbot,et al. Synthesis of Hafnia Powders and Nanofiltration Membranes by Sol-Gel Process , 2000 .
[4] Robert M. Wallace,et al. Stable zirconium silicate gate dielectrics deposited directly on silicon , 2000 .
[5] Robert M. Wallace,et al. ELECTRICAL PROPERTIES OF HAFNIUM SILICATE GATE DIELECTRICS DEPOSITED DIRECTLY ON SILICON , 1999 .
[6] C. Serna,et al. Optical constants of tetragonal and cubic zirconias in the infrared , 1996 .
[7] V. K. Parashar,et al. Thermal evolution of sol-gel derived zirconia and binary oxides of zirconia-silica , 1996, Journal of Materials Science Letters.
[8] P. Escribano,et al. Effect of hydrolysis time and type of catalyst on the stability of tetragonal zirconia-silica composites synthesized from alkoxides , 1993, Journal of Materials Science.
[9] P. Pramanik,et al. Aqueous sol-gel synthesis of powders in the ZrO2SiO2 system using zirconium formate and tetraethoxysilane , 1993 .
[10] H. Nasu,et al. Investigation of coordination state of Zr4+ ions in the sol—gel-derived ZrO2SiO2 glasses by EXAFS , 1991 .
[11] David V. Tsu,et al. Local bonding environments of Si–OH groups in SiO2 deposited by remote plasma‐enhanced chemical vapor deposition and incorporated by postdeposition exposure to water vapor , 1990 .
[12] S. W. Lee,et al. The infrared and Raman spectra of ZrO2-SiO2 glasses prepared by a sol-gel process , 1988 .
[13] K. S. Mazdiyasni,et al. Infrared and Raman Spectra of Zirconia Polymorphs , 1971 .
[14] C. Kittel. Introduction to solid state physics , 1954 .
[15] R. Wallace,et al. Hafnium and zirconium silicates for advanced gate dielectrics , 2000 .
[16] Mark E. Smith,et al. Structure of (ZrO2)x(SiO2)1-x xerogels (x=0.1, 0.2, 0.3 and 0.4) from FTIR, 29Si and 17O MAS NMR and EXAFS , 1999 .
[17] V. K. Parashar,et al. The role of N, N, Dimethylformamide and glycol in the preparation and properties of sol-gel derived silica , 1996 .
[18] M. Nogami. Glass preparation of the ZrO2SiO2 system by the sol-gel process from metal alkoxides , 1985 .