Automatic Inspection Of Mask Defects
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Semiconductor yield can be greatly affected by defective photomasks. Various methods of detection of photomask defects have been investigated in the past. This paper discusses some methods available for the detection of random defects and describes a newly developed automatic mask inspection system.
[1] J. E. Price,et al. A new look at yield of integrated circuits , 1970 .
[2] Mary L. Long,et al. Photomask Inspection Techniques For Predicting And Maximizing LSI Yield , 1976, Other Conferences.
[3] J.H. Bruning,et al. An automated mask inspection system—AMIS , 1975, IEEE Transactions on Electron Devices.