Physical Modeling of Retention in Localized Trapping Nitride Memory Devices

A physical model enabling accurate prediction of the retention in localized trapping nitride memory devices is presented first. The crucial components of this model are a correct observation of the charge distribution before and after cycling, and a thorough understanding of the charge detrapping and redistribution occurring in the nitride. The model is then validated for a large range of temperatures and number of cycles, and two different technologies. Finally, the results are exploited to identify the limiting factors of the retention loss, key for further improvement of nitride memory devices

[1]  J. Van Houdt,et al.  Cycling behavior of nitride charge profile in NROM-type memory cells , 2006, 2006 21st IEEE Non-Volatile Semiconductor Memory Workshop.

[2]  Chih-Yuan Lu,et al.  Cause of data retention loss in a nitride-based localized trapping storage flash memory cell , 2002, 2002 IEEE International Reliability Physics Symposium. Proceedings. 40th Annual (Cat. No.02CH37320).

[3]  The nature of HT V/sub t/ shift in NROM memory transistors , 2006, IEEE Transactions on Electron Devices.

[4]  M. Janai,et al.  4-bit per cell NROM reliability , 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..

[5]  M. Rosmeulen,et al.  Model for electron redistribution in silicon nitride , 2006, 2006 European Solid-State Device Research Conference.

[6]  Dongchan Kim,et al.  A novel NAND-type MONOS memory using 63nm process technology for multi-gigabit flash EEPROMs , 2005, IEEE InternationalElectron Devices Meeting, 2005. IEDM Technical Digest..

[7]  M. Janai,et al.  The kinetics of degradation of data retention of post-cycled NROM non-volatile memory products , 2005, 2005 IEEE International Reliability Physics Symposium, 2005. Proceedings. 43rd Annual..

[8]  G. G. Stokes "J." , 1890, The New Yale Book of Quotations.