DNA Origami Mask for Sub-Ten-Nanometer Lithography.

DNA nanotechnology is currently widely explored and especially shows promises for advanced lithography due to its ability to define nanometer scale features. We demonstrate a 9 × 14 nm(2) hole pattern transfer from DNA origami into an SiO2 layer with a sub-10-nm resolution using anhydrous HF vapor in a semiconductor etching machine. We show that the resulting SiO2 pattern inherits its shape from the DNA structure within a process time ranging from 30 to 60 s at an etching rate of 0.2 nm/s. At 600 s of etching, the SiO2 pattern meets corrosion and the overall etching reaction is blocked. These results, in addition to the entire surface coverage by magnesium occurring on the substrate at a density of 1.1 × 10(15) atom/cm(2), define a process window, fabrication rules, and limits for DNA-based lithography.

[1]  M. Reiche,et al.  History and Future of Semiconductor Wafer Bonding , 1995 .

[2]  S. Wind,et al.  Selective placement of DNA origami on substrates patterned by nanoimprint lithography , 2011 .

[3]  Hao Yan,et al.  Interconnecting gold islands with DNA origami nanotubes. , 2010, Nano letters.

[4]  Friedrich C Simmel,et al.  Single molecule characterization of DNA binding and strand displacement reactions on lithographic DNA origami microarrays. , 2014, Nano letters.

[5]  K. Sarveswaran,et al.  Guided deposition of individual DNA nanostructures on silicon substrates. , 2010, Langmuir : the ACS journal of surfaces and colloids.

[6]  Y. Lyubchenko,et al.  Visualization of supercoiled DNA with atomic force microscopy in situ. , 1997, Proceedings of the National Academy of Sciences of the United States of America.

[7]  Chengde Mao,et al.  Molecular lithography with DNA nanostructures. , 2004, Angewandte Chemie.

[8]  Yucheng Ding,et al.  Imprint template fabrication based on glass wet etching using a soft etching mask , 2006 .

[9]  M. Lieberman,et al.  Electron-beam lithography and molecular liftoff for directed attachment of DNA nanostructures on silicon: top-down meets bottom-up. , 2014, Accounts of chemical research.

[10]  A. Singh.  Challenges " # , 2006 .

[12]  Hyojeong Kim,et al.  Stability of DNA Origami Nanostructure under Diverse Chemical Environments , 2014 .

[13]  Shichao Zhao,et al.  Mechanistic Study of the Nanoscale Negative-Tone Pattern Transfer from DNA Nanostructures to SiO2 , 2015 .

[14]  A. Woolley,et al.  DNA shadow nanolithography. , 2007, Small.

[15]  W. Kern.  Cleaning solutions based on hydrogen peroxide for use in silicon semiconductor technology , 1970 .

[16]  Hao Yan,et al.  Controlled delivery of DNA origami on patterned surfaces. , 2009, Small.

[17]  Chang Auck Choi,et al.  Silicon surface micromachining by anhydrous HF gas-phase etching with methanol , 1998, Photonics West - Micro and Nano Fabricated Electromechanical and Optical Components.

[18]  G. Cunge,et al.  Scaling-down lithographic dimensions with block-copolymer materials: 10nm-sized features with PS-b-PMMA , 2013, Advanced Lithography.

[19]  Shichao Zhao,et al.  Molecular lithography through DNA-mediated etching and masking of SiO2. , 2011, Journal of the American Chemical Society.

[20]  S Mizushima,et al.  Determination of the amount of gas adsorption on SiO2/Si(100) surfaces to realize precise mass measurement , 2004 .

[21]  Viorel Dragoi,et al.  Mechanisms for room temperature direct wafer bonding , 2013 .

[22]  Paul W K Rothemund,et al.  Optimized assembly and covalent coupling of single-molecule DNA origami nanoarrays. , 2014, ACS nano.

[23]  Ryan J. Kershner,et al.  Placement and orientation of individual DNA shapes on lithographically patterned surfaces. , 2009, Nature nanotechnology.

[24]  T. Lindahl.  Instability and decay of the primary structure of DNA , 1993, Nature.

[25]  Luvena L. Ong,et al.  Three-Dimensional Structures Self-Assembled from DNA Bricks , 2012, Science.

[26]  V. Linko,et al.  The enabled state of DNA nanotechnology. , 2013, Current opinion in biotechnology.

[27]  P. Rothemund.  Folding DNA to create nanoscale shapes and patterns , 2006, Nature.

[28]  Mark Neisser,et al.  ITRS lithography roadmap: 2015 challenges , 2015 .